Certifications

iso9001
iso14001
icas
Delivery
security
warranty
roiginal
RoHS
UL
Millionen elektronischer Teile auf Lager. Preis- und Vorlaufzeitangebote innerhalb von 24 Stunden.

The first all-wafer GaAs laser was successfully manufactured on a 300mm silicon wafer

Jan 23 2025 2025-01 Passive Components Molex - Oplink Communications, LLC
Article Cover
Now the development of this technology is known as fast, silicon photonics such an emerging technology, has attracted the attention of all parties yo! The technology combines the advantages of silicon in electronics and the high efficiency of optoelectronics, hoping to rely on optical signals for high-speed data transmission to advance future communications, computing and sensing.

     Now the development of this technology is known as fast, silicon photonics such an emerging technology, has attracted the attention of all parties yo! The technology combines the advantages of silicon in electronics and the high efficiency of optoelectronics, hoping to rely on optical signals for high-speed data transmission to advance future communications, computing and sensing. Recently, there has been another important breakthrough, silicon photonics has become a hot topic! The research team successfully manufactured the first all-wafer GaAs laser on a 300mm silicon wafer, which is great.

     Let's talk about the technological breakthrough of this first all-wafer scale gallium arsenide laser. Gallium arsenide (GaAs) lasers have been widely used in optical communication, laser printing and optical disc since the 20th century because of their high efficiency and suitable for high frequency operation. However, this new GaAs laser is different from conventional lasers in that it is based on an all-wafer level manufacturing process and employs a high-quality heterogeneous structure, which makes the laser's performance even more impressive.

     Manufacturing GaAs lasers on 300mm silicon wafers is generally not difficult, mainly because of material compatibility and integrated density. But the scientists have a solution, and they use a variety of advanced processes, such as molecular beam epitaxy (MBE) and chemical vapor deposition (CVD), to ensure that the GaAs layer and silicon substrate can be combined with high quality. By optimizing the manufacturing process, they managed to provide the laser with high power output and very good optical performance, which is useful in silicon photonics applications.

     Let's talk a little bit more about the manufacturing process and application prospects. The manufacturing process of this gallium arsenide laser is a combination of many advanced technologies. First, the growth conditions must be precisely controlled in order to form a suitable GaAs heterogeneous layer on the silicon substrate. In this process, the interface design between materials is particularly important, and only by strictly controlling the process can we ensure that different materials can be well combined and the optical properties can be well transmitted.

     The laser has good high temperature and high frequency performance, and can be widely used in data center, optical communication network, high bandwidth data transmission and other fields. Because it can be seamlessly integrated with existing silicon photonics platforms, this new laser could greatly contribute to making optics smaller and more efficient, and support the rapid development of a variety of smart devices.

     This project breaks through the limitation of silicon-based materials and brings a new idea for the development of efficient laser sources. In the past, it has been difficult to perform laser emission directly in silicon, but the successful integration of GaAs lasers makes it possible to achieve more efficient light signal generation in silicon photonics. This cross-boundary material integration not only improves the power and efficiency of the laser, but also brings new opportunities for future multifunctional optoelectronic integrated circuits. By integrating the laser with the silicon-based MOSFETs and light modulator components, the researchers were able to compact optical and electrical functions onto the D55342K07B51D1T chip, significantly improving the overall performance of the system.

     The application potential of the new gallium arsenide laser in the field of data communication should not be underestimated. The volume of data is growing particularly fast, especially with the rapid development of cloud computing and artificial intelligence, and traditional telecommunications networks can no longer meet the demand for bandwidth. Photonic technology, especially silicon photonics combined with silicon-based GaAs lasers, can achieve high-speed optical signal transmission, and the connection efficiency of local area networks, wide area networks, and even data centers can be greatly improved.

     The laser has high power output and low delay, and can also make the signal stable and clear during long distance transmission, which lays a good foundation for the development of large-capacity data centers and broadband networks. At the same time, if this technology matures, it is also expected to make optical interconnection and optical computing more popular, so that the server is directly connected to the light, thereby reducing energy consumption and improving processing efficiency.

     With the success of all-wafer gallium arsenide lasers, the silicon photonics ecosystem is slowly taking shape. Researchers and engineers will work hard on this technology and explore more functional modules and components to build a photonic device platform capable of meeting future needs. This includes functional components, such as light modulators and light detectors, which are developed together to ensure effective cooperation between modules.

     The integration of the new laser platform with various photonic components will certainly provide strong support for emerging fields such as virtual reality, augmented reality and intelligent transportation systems in the future. By realizing high-speed and efficient photoelectric conversion, the new photon technology can not only improve the performance of the existing system, but also create more possible application scenarios and promote the digital transformation and intelligent upgrading of various industries in society

Die Produkte, an denen Sie interessiert sein könnten

ASPI-104S-221M-T ASPI-104S-221M-T FIXED IND 220UH 700MA 756 MOHM 4914

More on Order

AIAP-02-680K AIAP-02-680K FIXED IND 68UH 1.5A 142 MOHM TH 30228

More on Order

AMPMEGA-7.3728T3 AMPMEGA-7.3728T3 MEMS OSC XO 7.3728MHZ CMOS SMD 7938

More on Order

AMPMGGD-24.5000T AMPMGGD-24.5000T MEMS OSC XO 24.5000MHZ CMOS SMD 6084

More on Order

AMPMGFC-22.5792T AMPMGFC-22.5792T MEMS OSC XO 22.5792MHZ CMOS SMD 2628

More on Order

AMPMADB-40.0000T AMPMADB-40.0000T MEMS OSC XO 40.0000MHZ CMOS SMD 6354

More on Order

AMPMEFB-4.0000 AMPMEFB-4.0000 MEMS OSC XO 4.0000MHZ CMOS SMD 4158

More on Order

AMPMDED-2.0800 AMPMDED-2.0800 MEMS OSC XO 2.0800MHZ CMOS SMD 7686

More on Order

AMPMGFD-25.0000 AMPMGFD-25.0000 MEMS OSC XO 25.0000MHZ CMOS SMD 8280

More on Order

AX5DAF3-1050.0000T AX5DAF3-1050.0000T OSC XO 1.05GHZ 3.3V LVDS 8748

More on Order

AX7DCF3-920.0000T AX7DCF3-920.0000T XTAL OSC XO 920.0000MHZ LVDS SMD 8334

More on Order

AX7DBF2-780.0000T AX7DBF2-780.0000T XTAL OSC XO 780.0000MHZ LVDS SMD 4338

More on Order

AX5DBF1-880.0000T AX5DBF1-880.0000T OSC XO 880MHZ 2.5V LVDS 8100

More on Order

AX7MCF3-450.0000C AX7MCF3-450.0000C XTAL OSC XO 450.0000MHZ CML SMD 5454

More on Order

AX7DAF2-400.0000C AX7DAF2-400.0000C XTAL OSC XO 400.0000MHZ LVDS SMD 3418

More on Order

AX5HBF1-515.0000C AX5HBF1-515.0000C OSC XO 515MHZ 2.5V HCSL 6552

More on Order

AX7MBF3-200.0000C AX7MBF3-200.0000C XTAL OSC XO 200.0000MHZ CML SMD 5562

More on Order

AX5HCF1-270.0000T AX5HCF1-270.0000T OSC XO 270MHZ 1.8V HCSL 5580

More on Order

AX5HBF1-300.0000T AX5HBF1-300.0000T OSC XO 300MHZ 2.5V HCSL 2340

More on Order

ASTMHTD-25.000MHZ-AR-E ASTMHTD-25.000MHZ-AR-E MEMS OSC XO 25.0000MHZ LVCMOS 8172

More on Order

ASEM1-11.0592MHZ-LC-T ASEM1-11.0592MHZ-LC-T MEMS OSC XO 11.0592MHZ CMOS SMD 14088

More on Order

ABM13W-45.0000MHZ-6-NH7G-T5 ABM13W-45.0000MHZ-6-NH7G-T5 CRYSTAL 45MHZ 6PF SMD 2880

More on Order

ABM13W-38.4000MHZ-5-D1G-T5 ABM13W-38.4000MHZ-5-D1G-T5 CRYSTAL 38.4MHZ 5PF SMD 7074

More on Order

ABM11W-24.5454MHZ-8-K2Z-T3 ABM11W-24.5454MHZ-8-K2Z-T3 CRYSTAL 24.5454MHZ 8PF SMD 7884

More on Order